| Vistec SB3050 Series |
 |
 |
|
|
| |
|
| Overview |
|
The Vistec SB3050 Series - now with Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the 32nm technology node, it features variable shape beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization.
Our industrial proven 300mm design concept has been successfully materialized in more than 10 installations worldwide.
|
|
| |
| Key Features |
|
 |
50keV high-resolution electron optics with 1nm writing/address grid |
|
|
|
310x310mm² stage travel range to ensure full 300mm wafer exposure capability |
|
|
|
High throughput achieved by the “write-on-the-fly” principle combined with Flexible Stage Speed (FSS) |
|
|
|
State of the art fully automatic substrate handling with mini environment to satisfy the requirements of most advanced resist technologies |
|
|
|
Wafer Mix & Match with optical lithography supported by production compatible correction methods |
|
|
|
Integrated monitoring software for all critical process parameters |
|
|
|
High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing |
|
|
|
Small cleanroom footprint < 27m² |
|
|
|
Cell Projection option for combined use with VSB principle for further throughput improvement |
|
|
|
| |
|
| |
/6ADBC5F15ACC54AEC1257170003C14BE/$FILE/SB3050_Vistec_prod_b_kg.jpg','PicturePopUp','scrollbars=no,status=no,width=650,height=500' ); void(0))
