| Vistec EBPG5200 Series |
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| Overview |
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The Vistec EBPG5200 is a high performance nanolithography system with full 200mm writing capability. This Electron Beam Lithography system presents a further evolutionary stage of the highly successful and field-proven EBPG series and offers a wide range of leading edge solutions for both direct write nano-lithography and R&D mask making in Universities and Commercial Centres of excellence.
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| Key Features |
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High current density Thermal Field Emission gun for operation at 20, 50 and 100 kV |
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Routine production of line with structures to less than 8 nm level |
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max. stage travel range 210 mm x 210 mm |
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Rapid exposure with 50 MHz pattern generator |
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Includes automatic 10-holder airlock as standard |
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GUI for ease of use for diverse "multi user environments" |
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