E-Beam Lithography
		E-Beam Lithography Systems
Vistec Electron Beam Lithography Group is providing leading edge technology solutions in all areas of advanced lithography, both in production for direct write and mask making as well as in applied research and nanotechnology. The company serves customers in semiconductor industry including compound semiconductor and mask making, advanced research, optics and emerging markets like nanotechnology. Vistec has Gaussian Beam and Variable Shaped Beam systems in their product portfolio. Vistec’s Gaussian Beam systems which are characterized by a 2nm spot size at 100keV acceleration voltage are the system of choice for nanotechnology and most advanced research applications. Gaussian Beam systems made by Vistec are installed in most of the leading edge universities and industry research laboratories all over the world.Further these Gaussian Beam systems are widely used in compound semiconductor industry.
Vistec’s Variable Shaped Beam systems are most advanced systems for electron-beam direct write in terms of throughput, accuracy and automation. This is where Vistec currently holds a leading market position.The specific architecture of the 50keV systems offers high resolution patterning down to 32nm technology node and enables their use in fast prototyping, design evaluation and small volume production.Beside direct write applications shaped beam system from Vistec are used for mask making applications.