Vistec VB300

Detailed Description

Overview

The Vistec VB300 is a further evolutionary development from the highly successful VB6HR and UHR systems. Its advanced capabilities have enabled it to develop a leading edge role in a wide range of key application areas. The state of the art electron optics delivers a sub 2nm spot size enabling nano lithography structures of <10nm to be routinely generated. Its high resolution, accuracy and overall flexibility allows a wide range of advanced device developments in the areas of CMOS R&D , single electron transistors, Quantum Functional Devices, Photronic elements, next generation lithography techniques for mask nanoimprint and EUV mask manufacture.

Key Features

High current density Thermal Field Emission gun for operation at 50keV to 100keV

Rapid exposure with 50Mhz pattern generator and 20bit resolution

Ability to load piece part substrates to full 300mm wafers. Mask plates to 7inch

Routine production of line width structures to less than 10nm level

Continuously variable field size operation from 160microns to 1.2mm

Includes automatic 10-holder airlock as standard

Includes flexible system software and new user friendly GUI