| Vistec SB351 | ||||||||||||
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| Detailed Description | ||||||||||||
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| The high-precision stage features a travel range of 310mm x 310mm, which allows complete exposure of 300mm wafers for direct write applications. The Vistec SB351 is fully compatible with SEMI standard mask sizes up to 9 inches and wafer sizes up to 300mm. The proven combination of the “write-on-the-fly” writing mode and the Flexible Stage Speed (FSS) principle increases throughput – an essential parameter for commercial applications as mask making and Electron Beam Direct Write. |
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