The Vistec SB3050 Series combines state of the art substrate handling with a high-precision stage system and a sophisticated electron-optical 50 keV column specifically developed to guarantee the excellent resolution performance you need for your challenging applications.
Thanks to the production-compatible Graphical User Interface (GUI) the Vistec SB3050 can be easily integrated into automated production environments (CIM). Being capable of exposing both masks (including templates) and wafers, the SB3050 exposure tools are the ideal bridge to next generation technology nodes.
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