| Vistec EBPG5000 plus |
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| Overview |
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The Vistec EBPG5000plus is a further evolution of the highly successful, field proven EBPG4 and 5 systems. The Vistec EBPG series has established a Worldwide position for advanced nano lithography applications, particularly in direct writing of both R&D and production GaAs devices.
The system can operated to <2.5nm spot size at 100keV beam energy, enabling nano lithography structures of <10nm to be routinely generated. Its high placement accuracy and extensive easy to use software has enabled this system to have a “system of choice” reputation.
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| Key Features |
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High current density Thermal Field Emission gun for operation at 50keV and100keV |
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Routine production of line width structures to less than 10nm level |
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Rapid exposure with 50Mhz pattern generator |
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Includes automatic 10-holder airlock as standard |
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Extensive software suite for direct write applications in a mix and match mode of operation |
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Networking capability for remote operation |
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