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| Overview |
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The EBPG5000pES (Entry System) is a cost effective entry system to the high-end nano lithography market retaining the core features of the full EBPG5000plus. New customers also have access to a structured future upgrade path enabling the system to be upgraded to a current full EBPG5000plus performance, along with new system upgrades currently under development.
This enables a path for tracking future technology trends as well as protecting the customer’s initial system investment.
The system can operated to <2.5nm spot size at 100keV beam energy, enabling nano lithography structures of <10nm to be routinely generated. Its high placement accuracy and extensive easy to use software has enabled this system have a “system of choice” reputation.
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| Key Features |
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High current density Thermal Field Emission gun for operation at 50keV to 100keV |
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Routine production of line width structures to less than 10nm level |
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Rapid exposure with 20Mhz pattern generator |
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Includes automatic 2-holder airlock as standard |
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Extensive software suite for direct write applications in a mix and match mode of operation |
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Networking capability for remote operation |
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| http://lithogroup.vistec-semi.com |
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