Vistec SB3050 Series

Overview

The Vistec SB3050 Series - now with Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the 32nm technology node, it features variable shape beam (VSB) technology with vector scan and continuously moving stage principles for throughput optimization. Our industrial proven 300mm design concept has been success­fully materialized in more than 10 installations worldwide.

Key Features

50keV high-resolution electron optics with 1nm writing/address grid

310x310mm² stage travel range to ensure full 300mm wafer exposure capability

High throughput achieved by the “write-on-the-fly” principle combined with Flexible Stage Speed (FSS)

State of the art fully automatic substrate handling with mini environment to satisfy the requirements of most advanced resist technologies

Wafer Mix & Match with optical lithography supported by production compatible correction methods

Integrated monitoring software for all critical process parameters

High speed data processing allows fast data generation including flexible Proximity Effect Correction with distributed computing

Small cleanroom footprint < 27m²

Cell Projection option for combined use with VSB principle for further throughput improvement

Detailed Description

The Vistec SB3050 Series combines state of the art substrate handling with a high-precision stage system and a sophisti­cated electron-optical 50 keV column specifically developed to guarantee the excellent resolution performance you need for your challenging applications. Thanks to the production-compatible Graphical User Interface (GUI) the Vistec SB3050 can be easily integrated into automated production environments (CIM). Being capable of exposing both masks (including templates) and wafers, the SB3050 exposure tools are the ideal bridge to next generation technology nodes.

http://lithogroup.vistec-semi.com