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| Overview |
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The Vistec EBPG5000plus is a further evolution of the highly successful, field proven EBPG4 and 5 systems. The Vistec EBPG series has established a Worldwide position for advanced nano lithography applications, particularly in direct writing of both R&D and production GaAs devices.
The system can operated to <2.5nm spot size at 100keV beam energy, enabling nano lithography structures of <10nm to be routinely generated. Its high placement accuracy and extensive easy to use software has enabled this system to have a “system of choice” reputation.
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| Key Features |
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High current density Thermal Field Emission gun for operation at 50keV and100keV |
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Routine production of line width structures to less than 10nm level |
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Rapid exposure with 50Mhz pattern generator |
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Includes automatic 10-holder airlock as standard |
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Extensive software suite for direct write applications in a mix and match mode of operation |
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Networking capability for remote operation |
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| Detailed Description |
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The Premium Gaussian Beam Direct Write System
The Vistec EBPG Series proven delivery of 100keV beam energy, high placement accuracy and extensive, easy to use software has led to its "tool of choice" reputation.
The introduction of the latest EBPG5000 system is completed with a coherent roadmap of enhancements to maintain the value of the large user base investments in the product series earlier variants. |
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| http://lithogroup.vistec-semi.com |
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